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One of the challenges in the development and manufacture of MEMS and other devices is the measurement of the thickness of SU-8 and other thick photoresists. Though simple and quick, spin coating SU-8 can be an inaccurate method for yielding a desired thickness. Since exposure time is dependent on resist thickness, an accurate measurement must be taken. Moreover, since positive and negative photoresists can be used in conjunction to create complex multiplayer structures, knowing the thicknesses of each layer becomes extremely important.
Filmetrics offers a range of tabletop (F20 and F20-XT) and mapping solutions for measuring the thickness of SU-8 and other photoresists. Single layer, multi-layer, and even freestanding films can be measured from <0.1 to 100s of microns. All Filmetrics models measure thickness (and index) by accurately modeling spectral reflectance. Special proprietary algorithms allow robust “one-click” analysis, with results typically available in less than a second. |
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For thick resist measurements, contact Dr. Charles Chen or any of our other thin-film expert.
Filmetrics offers free trial measurements –
results are typically available in 1-2 days |
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